THE GERMANIUM DIARIES

≤ 0.15) is epitaxially developed on the SOI substrate. A thinner layer of Si is grown on this SiGe layer, then the construction is cycled through oxidizing and annealing phases. A result of the preferential oxidation of Si above Ge [68], the initial Si1–It truly is brittle. Utilizes Germanium is usually a semiconductor. The pure component was f